Kaʻina hana hoʻoheheʻe a me ka hoʻomaʻemaʻe ʻana o ka Sulfur 6N Ultra-High-Purity me nā palena kikoʻī‌

ʻO ka hana ʻana o ka sulfur 6N (≥99.9999% maʻemaʻe) ultra-high-purity e pono ai ka distillation multi-stage, adsorption hohonu, a me ka kānana ultra-clean e hoʻopau i nā metala trace, nā haumia organik, a me nā particulates. Aia ma lalo kahi kaʻina hana ʻoihana e hoʻohui ana i ka distillation vacuum, ka hoʻomaʻemaʻe microwave-assisted, a me nā ʻenehana post-treatment pololei.

I. Ka mālama mua ʻana i nā mea maka a me ka wehe ʻana i nā mea haumia

1. Ke Koho ʻana i nā Mea Maka a me ka Hoʻomaʻamaʻa mua ʻana

• ?Nā koi‌: Maʻemaʻe sulfur mua ≥99.9% (papa 3N), nā haumia metala āpau ≤500 ppm, ka nui o ke kalapona organik ≤0.1%.
• ?Hoʻoheheʻe ʻia me ke kōkua o ka microwave‌:
  Hoʻoponopono ʻia ka sulfur maka i loko o kahi mea hana microwave (alapine 2.45 GHz, mana 10-15 kW) ma 140-150°C. ʻO ka hoʻohuli ʻana o ka dipole i hoʻokomo ʻia e ka microwave e hōʻoia i ka heheʻe wikiwiki ʻana i ka wā e palaho ana i nā mea haumia organik (e laʻa, nā hui tar). Ka manawa heheʻe: 30-45 mau minuke; ka hohonu o ke komo ʻana o ka microwave: 10-15 cm
• ?Holoi Wai Deionized‌:
  Hoʻohui ʻia ka sulfur hoʻoheheʻe ʻia me ka wai deionized (resistivity ≥18 MΩ·cm) ma ka lakio nuipa 1:0.3 i loko o kahi reactor i hoʻoulu ʻia (120°C, kaomi 2 bar) no 1 hola e wehe i nā paʻakai wai-soluble (e laʻa, ammonium sulfate, sodium chloride). Hoʻokahe ʻia ka pae wai a hoʻohana hou ʻia no 2-3 mau pōʻaiapuni a hiki i ka conductivity ≤5 μS/cm.

2. Hoʻohuihui a me ka kānana ʻana i nā pae he nui

• ?Hoʻopili ʻia ka Honua Diatomaceous/Kalapona Hoʻāla ʻia‌:
  Hoʻohui ʻia ka lepo diatomaceous (0.5–1%) a me ke kalapona i hoʻāla ʻia (0.2–0.5%) i ka sulfur i hoʻoheheʻe ʻia ma lalo o ka pale ʻana o ka naikokene (130°C, hoʻouluulu ʻana i 2 hola) e hoʻopili i nā hui metala a me nā meaola i koe.
• ?Kānana Pololei Loa‌:
  Kānana ʻelua pae me ka hoʻohana ʻana i nā kānana titanium sintered (0.1 μm pore size) ma ke kaomi ʻōnaehana ≤0.5 MPa. Helu ʻāpana ma hope o ke kānana ʻana: ≤10 mau ʻāpana/L (nui >0.5 μm).

II. Ke Kaʻina Hana Hoʻoheheʻe Vacuum Multi-Stage

1. Hoʻoheheʻe mua (Wehe ʻana i ka haumia metala)

• ?Lako‌: Koluma distillation quartz maʻemaʻe kiʻekiʻe me ka hoʻopili ʻana i hana ʻia me ke kila kila 316L (≥15 mau papa kumumanaʻo), vacuum ≤1 kPa.
• ?Nā Palena Hana‌:
• ?Mahana hānai‌: 250–280°C (hoʻolapalapa ka sulfur ma 444.6°C ma lalo o ke kaomi ambient; hoʻemi ka vacuum i ke kiko hoʻolapalapa i 260–300°C).
• ?Ka Lākiō Reflux‌: 5:1–8:1; ka loli ʻana o ka mahana o luna kolamu ≤±0.5°C.
• ?Huahana‌: Maʻemaʻe sulfur i hoʻopaʻa ʻia ≥99.99% (papa 4N), huina haumia metala (Fe, Cu, Ni) ≤1 ppm.

2. Ka Hoʻoheheʻe ʻana i ka Molekala Lua (Wehe ʻana i ka Haumia Ola)

• ?Lako‌: Mea hoʻoheheʻe molekala ala pōkole me ka hakahaka hoʻoheheʻe-hoʻohuʻu 10–20 mm, mahana hoʻoheheʻe 300–320°C, vacuum ≤0.1 Pa.
• ?Ka Hoʻokaʻawale ʻana i ka Haumia‌:
  Hoʻomake ʻia a hoʻoneʻe ʻia nā mea olaola e paila haʻahaʻa ana (e like me nā thioethers, thiophene), ʻoiai nā mea haumia e paila nui ana (e like me nā polyaromatics) e noho ana i loko o nā koena ma muli o nā ʻokoʻa o ke ala manuahi molekala.
• ?Huahana‌: Maʻemaʻe sulfur ≥99.999% (papa 5N), kalapona organik ≤0.001%, helu koena <0.3%.

‌3. Ka Hoʻomaʻemaʻe ʻana i ka ʻĀpana Tertiary (Ke Hoʻokō nei i ka Maʻemaʻe 6N)‌

• ?Lako‌: Mea hoʻomaʻemaʻe ʻāpana pae me ka kaohi mahana multi-zone (±0.1°C), ka wikiwiki o ka huakaʻi ʻāpana 1–3 mm/h.
• ?Hoʻokaʻawale ʻana‌:
  Ke hoʻohana nei i nā coefficients segregation (K=Csolid/Cliquid)K=CpaʻaCwai​), hele ka ʻāpana 20–30 i nā metala i hoʻohuihui ʻia (As, Sb) ma ka hopena ingot. Hoʻolei ʻia ka 10–15% hope loa o ka ingot sulfur.

‌III. Ma hope o ka mālama ʻana a me ka hoʻokumu ʻana i ka Ultra-Clean‌

1. Ka Hoʻokaʻawale ʻana i ka Mea Hoʻoheheʻe Maʻemaʻe Loa

• ?Ka Hoʻokaʻawale ʻana o ka Ether/Carbon Tetrachloride‌:
  Ua hui ʻia ka sulfur me ka ether chromatographic-grade (1:0.5 volume ratio) ma lalo o ke kōkua ultrasonic (40 kHz, 40°C) no 30 mau minuke e wehe i nā mea organik polar.
• ?Hoʻōla hou ʻana o ka mea hoʻoheheʻe‌:
  Hoʻemi ka adsorption sieve molecular a me ka distillation vacuum i nā koena solvent i ≤0.1 ppm.

2. Ultrafiltration a me ka Ion Exchange

• ?Ka kānana ʻana o ka membrane PTFE‌:
  Kānana ʻia ka sulfur hoʻoheheʻe ʻia ma o nā membrane PTFE 0.02 μm ma 160–180°C a me ke kaomi ≤0.2 MPa.
• ?Nā Resina Hoʻololi Ion‌:
  Hoʻopau nā resins Chelating (e laʻa, Amberlite IRC-748) i nā ion metala pae ppb (Cu²⁺, Fe³⁺) ma nā kahe kahe o 1–2 BV/h.

‌3. Hoʻokumu ʻana i ke kaiapuni maʻemaʻe loa‌

• ?Ka hoʻoheheʻe ʻana o ke kinoea inert‌:
  I loko o kahi lumi maʻemaʻe Papa 10, hoʻohuihui ʻia ka sulfur heheʻe me ka naikokene (kaomi 0.8–1.2 MPa) i loko o nā granules poepoe 0.5–1 mm (maku <0.001%).
• ?ʻŌmole Vacuum‌:
  Hoʻopaʻa ʻia ka huahana hope loa i loko o ka ʻili alumini composite ma lalo o ka argon ultra-pure (≥99.9999% maʻemaʻe) e pale aku i ka oxidation.

IV. Nā Palena Kaʻina Hana Koʻikoʻi

V. Ka Mana Hoʻomalu a me ka Hoʻāʻo ʻana i ka maikaʻi

1. ?Ka Nānā ʻana i ka Haumia o ke Ala‌:

• ?GD-MS (Glow Discharge Mass Spectrometry)‌: ʻIke i nā metala ma ≤0.01 ppb.
• ?Mea kālailai TOC‌: Ke ana i ke kalapona organik ≤0.001 ppm.

1. ?Ka Mana o ka Nui o nā ʻĀpana‌:
   Hoʻomaopopo ka diffraction laser (Mastersizer 3000) i ka ʻokoʻa D50 ≤±0.05 mm.
2. ?Ka Maʻemaʻe o ka ʻIli‌:
   Hōʻoia ka XPS (X-ray Photoelectron Spectroscopy) i ka mānoanoa o ka ʻokikene o ka ʻili ≤1 nm.

VI. Palekana a me ka Hoʻolālā Kaiapuni

1. ?Kāohi ʻana i ka pahū‌:
   Mālama nā mea ʻike lapalapa infrared a me nā ʻōnaehana hoʻopiha nitrogen i nā pae oxygen <3%
2. ?Ka Mana Hoʻokuʻu ʻana‌:

• ?Nā Kinoea ʻakika‌: ʻO ka holoi ʻana i ka NaOH ʻelua pae (20% + 10%) e wehe i ka ≥99.9% H₂S/SO₂.
• ?Nā VOC‌: Hoʻemi ka Zeolite rotor + RTO (850°C) i nā hydrocarbons non-methane i ≤10 mg/m³.

1. ?Hoʻopōʻaiapuni ʻōpala‌:
   Hoʻihoʻi ka hōʻemi wela kiʻekiʻe (1200°C) i nā metala; ʻo ka nui o ke koena sulfur <0.1%.

VII. Nā Ana ʻenehana-hoʻokele waiwai

• ?Ka hoʻohana ʻana i ka ikehu‌: uila 800–1200 kWh a me 2–3 tone mahu no kēlā me kēia tone o 6N sulfur.
• ?Hua‌: Hoʻōla ʻia ka sulfur ≥85%, ka helu koena <1.5%.
• ?Kumukūʻai‌: Kumukūʻai hana ~120,000–180,000 CNY/tona; kumukūʻai mākeke 250,000–350,000 CNY/tona (pae semiconductor).

Hoʻopuka kēia kaʻina hana i ka 6N sulfur no nā photoresists semiconductor, nā substrates hui III-V, a me nā noi holomua ʻē aʻe. ʻO ka nānā ʻana i ka manawa maoli (e laʻa, ka loiloi elemental LIBS) a me ka calibration lumi maʻemaʻe ISO Class 1 e hōʻoia i ka maikaʻi mau.

Nā memo wāwae

1. Kuhikuhi 2: Nā Kūlana Hoʻomaʻemaʻe Sulfur ʻOihana
2. Kuhikuhi 3: Nā ʻenehana kānana holomua i ka ʻenekinia kemika
3. Kuhikuhi 6: Puke Pai Hana Hana Mea Maʻemaʻe Kiʻekiʻe
4. Kuhikuhi 8: Nā Protocols Hana Kemika Papa Semiconductor
5. Kuhikuhi 5: Hoʻonui ʻana i ka Vacuum Distillation