6N Ultra-High-Purity Sulfur Distillation a me ka hoʻomaʻemaʻe ʻana me nā ʻāpana kikoʻī‌

ʻO ka hana ʻana o 6N (≥99.9999% maʻemaʻe) ultra-high-purity sulfur e pono ai ka distillation multi-stage, adsorption hohonu, a me ka kānana ultra-maʻemaʻe e hoʻopau i nā metala, nā mea haumia, a me nā ʻāpana. Aia ma lalo kahi kaʻina hana ʻenehana e hoʻohui ana i ka hoʻoheheʻe ʻana i ka ʻūhā, ka hoʻomaʻemaʻe kōkua microwave, a me nā ʻenehana ma hope o ka mālama ʻana.

I. Hoʻomaʻamaʻa mua a me ka wehe ʻana i ka haumia

1. Ke koho ʻana a me ka mālama mua ʻana

• ?Nā koi‌ : ʻO ka hoʻomaʻemaʻe sulfur mua ≥99.9% (3N grade), ka nui o nā mea haumia metala ≤500 ppm, ka ʻona kalapona kūlohelohe ≤0.1%.
• ?Hoʻoheheʻe ʻia i ka Microwave:
  Hana ʻia ka sulfur maʻemaʻe i loko o ka microwave reactor (2.45 GHz frequency, 10–15 kW mana) ma 140–150°C. ʻO ka hoʻololi ʻana i ka dipole i hoʻokomo ʻia i ka microwave e hōʻoiaʻiʻo i ka hoʻoheheʻe wikiwiki ʻana i ka wā e hoʻoheheʻe ʻia ai nā mea haumia (e laʻa, nā pūhui tar). Ka manawa hehee: 30-45 minuke; ka hohonu komo o ka microwave: 10–15 knm
• ?Holoi wai deionized:
  Hoʻohui ʻia ka sulfur i hoʻoheheʻe ʻia me ka wai deionized (resistivity ≥18 MΩ·cm) ma kahi ratio 1:0.3 i loko o kahi reactor hoʻoulu ʻia (120°C, 2 bar pressure) no 1 hola e wehe i nā paʻakai hiki ke hoʻoheheʻe i ka wai (e laʻa, ammonium sulfate, sodium chloride). Hoʻopau ʻia ka ʻāpana wai a hoʻohana hou ʻia no nā pōʻai 2-3 a hiki i ka conductivity ≤5 μS/cm.

2. ʻO ka Adsorption Multi-Stage a me ka kānana‌

• ?ʻO ka honua Diatomaceous/Kaona Hoʻōla:
  Hoʻohui ʻia ka honua diatomaceous (0.5–1%) a me ke kalapona i hoʻōla ʻia (0.2-0.5%) i ka sulfur hoʻoheheʻe ʻia ma lalo o ka pale ʻana o ka nitrogen (130°C, 2-hola e hoʻoulu ai) e hoʻopili i nā mea paʻakikī metala a me nā koena organik.
• ?Uku-Precision kānana:
  ʻElua papa kānana me ka hoʻohana ʻana i nā kānana sintered titanium (0.1 μm pore nui) ma ≤0.5 MPa kaomi ʻōnaehana. Ka helu ʻana o ka ʻāpana ma hope o ka kānana ʻana: ≤10 mau ʻāpana/L (nui> 0.5 μm).

II. Ke Kaʻina Hana Hoʻomāmā

1. ʻO ka hoʻoheheʻe mua ʻana (Metal Impurity Wehe).

• ?Mea lako‌ : ʻO ke kolamu quartz distillation kiʻekiʻe me ka 316L stainless steel i hoʻonohonoho ʻia (≥15 theoretical plates), vacuum ≤1 kPa.
• ?Nā ʻāpana hana:
• ?Hanai Mahana‌: 250–280°C (huhū sulfur ma 444.6°C ma lalo o ke kaomi ambient; hoʻemi ʻia ka pahu hoʻolapalapa i 260–300°C).
• ?Pākuʻi Reflux: 5:1–8:1; kolamu luna wela fluctuation ≤±0.5°C.
• ?Huahana‌ : Maʻemaʻe sulfur condensed ≥99.99% (4N grade), huina metala haumia (Fe, Cu, Ni) ≤1 ppm.

2. ʻO ka hoʻoheheʻe ʻana i nā molekele lua

• ?Mea lako‌ : Pōkole-ala molecular distiller me 10–20 mm evaporation-condensation āpau, evaporation wela 300–320°C, momi ≤0.1 Pa.
• ?Hoʻokaʻawale haumia:
  Hoʻokuʻu ʻia nā mea hoʻolapalapa haʻahaʻa (e laʻa, thioethers, thiophene) a hoʻokuʻu ʻia, aʻo nā mea haumia kiʻekiʻe-boila (e laʻa, polyaromatics) e noho i nā koena ma muli o nā ʻokoʻa o ke ala manuahi molekala.
• ?Huahana‌ : Sulfur maʻemaʻe ≥99.999% (5N grade), organic carbon ≤0.001%, koena helu <0.3%.

3. ʻO ka hoʻomaʻemaʻe ʻana i ka ʻāpana kula kiʻekiʻe (e loaʻa ana i ka maʻemaʻe 6N).

• ?Mea lako‌ : Mea hoʻomaʻemaʻe ʻāpana ʻāpana me ka mana wela o nā ʻāpana he nui (± 0.1°C), ka wikiwiki o ka huakaʻi 1-3 mm/h.
• ?Hoʻokaʻawale:
  Ke hoʻohana nei i nā helu hoʻokaʻawale (K=Csolid/CliquidK=Cpaʻa /Cwai), 20-30 wahi e hala i nā metala concentrate (As, Sb) ma ka hope ingot. Hoʻolei ʻia ka 10-15% hope loa o ka sulfur ingot.

III. Ma hope o ka Lapaʻau ʻana a me ka Ultra-Maʻemaʻe

1. Hoʻoheheʻe ʻia ʻo Ultra-Pure Solvent

• ?Etera/Carbon Tetrachloride Wehe:
  Hoʻohui ʻia ka Sulfur me ka chromatographic-grade ether (1:0.5 volume ratio) ma lalo o ke kōkua kani ultrasonic (40 kHz, 40°C) no 30 mau minuke no ka wehe ʻana i ka polar organics.
• ?Hoʻihoʻi ʻana i ka solvent:
  Molecular sieve adsorption a me ka vacuum distillation e hoemi i na koena solvent i ≤0.1 ppm.

2. Ultrafiltration a me Ion Exchange‌

• ?PTFE Membrane Ultrafiltration:
  Hoʻopili ʻia ka sulfur i hoʻoheheʻe ʻia ma o 0.02 μm PTFE membranes ma 160-180 ° C a me ≤0.2 MPa kaomi.
• ?Ion Exchange Resins:
  ʻO nā resine Chelating (e laʻa, Amberlite IRC-748) wehe i nā ion metala pae ppb (Cu²⁺, Fe³⁺) ma 1-2 BV/h kahe kahe.

3. Hoʻokumu ʻia ka Kaiapuni Ultra-Maʻemaʻe

• ?ʻAtomization kinoea inert:
  I loko o kahi lumi maʻemaʻe Papa 10, hoʻoheʻe ʻia ka sulfur me ka nitrogen (0.8–1.2 MPa kaomi) i loko o 0.5-1 mm spherical granules (moisture <0.001%).
• ?Hoʻopaʻa ʻumehana:
  Hoʻopaʻa ʻia ka huahana hope loa i loko o ke kiʻi ʻoniʻoni alumini ma lalo o ka argon ultra-pure (≥99.9999% maʻemaʻe) e pale ai i ka oxidation.

IV. Nā ʻāpana kaʻina hana nui

V. Ka Mana Pono a me ka hoao ana

1. ?Ka Huli Hoʻomaʻemaʻe:

• ?GD-MS (Glow Discharge Mass Spectrometry)‌ : ʻIke i nā metala ma ≤0.01 ppb.
• ?TOC Analyzer‌ : Ana i ke kalapona organik ≤0.001 ppm .

1. ?Hoʻoponopono i ka nui o ka ʻāpana:
   ʻO ka hoʻokaʻawale laser (Mastersizer 3000) e hōʻoia i ka D50 deviation ≤±0.05 mm.
2. ?Maʻemaʻe o ka ʻili:
   Hōʻoia ka XPS (X-ray Photoelectron Spectroscopy) i ka mānoanoa o ka oxide ≤1 nm.

VI. Palekana a me ka Hoʻolālā Kaiapuni‌

1. ?Kāohi Pahū:
   Mālama nā mea ʻike ahi infrared a me nā ʻōnaehana hoʻoheheʻe nitrogen i nā pae oxygen <3%
2. ?Ka hoʻokuʻu ʻana:

• ?Nā kinoea ʻakika‌ : ʻO ka holoi ʻana i ka NaOH ʻelua-pae (20% + 10%) wehe i ≥99.9% H₂S/SO₂.
• ?VOC‌ : Hoʻemi ʻo Zeolite rotor + RTO (850°C) i nā hydrocarbons non-methane i ≤10 mg/m³ .

1. ?Hoʻopalapala ʻōpala:
   ʻO ka hoʻohaʻahaʻa wela kiʻekiʻe (1200 ° C) hoʻihoʻi i nā metala; koena sulfur maʻiʻo <0.1% .

VII. ʻIke ʻenehana-Economic

• ?Hoʻohana i ka ikehu‌ : 800–1200 kWh uila a me 2–3 tona mahu no ke tona o 6N sulfur.
• ?Hāʻawi‌ : Hoʻihoʻi sulfur ≥85%, koena helu <1.5%.
• ?Koina‌ : Koina hana ~120,000–180,000 CNY/ton; kumu kūʻai makeke 250,000–350,000 CNY/ton (papa semiconductor) .

Hoʻopuka kēia kaʻina hana i ka 6N sulfur no nā kiʻi kiʻi semiconductor, III-V pūhui substrates, a me nā noi holomua ʻē aʻe. ʻO ka nānā ʻana i ka manawa maoli (e laʻa, LIBS elemental analysis) a me ISO Class 1 cleanroom calibration e hōʻoia i ka maikaʻi.

Kuhikuhi wāwae

1. Nānā 2: Nā Kūlana Hoʻomaʻemaʻe Sulfur ʻOihana
2. Nānā 3: Nā ʻenehana kānana kiʻekiʻe ma ka ʻenekinia ʻenekinia
3. Hōʻike 6: Puke Hoʻoponopono Mea Maʻemaʻe Kiʻekiʻe
4. Hōʻike 8: Semiconductor-Grade Chemical Production Protocols
5. Kuhikuhi 5: Hoʻomāmā